Our new seafront location

Our new home at the innovative Bay Campus provides some of the best university facilities in the UK, in an outstanding location. 

£22 million Centre for NanoHealth

This unique facility linking the College of Engineering, Science and Medicine houses a unique micro-nano fabrication clean room embedded within a biological research laboratory and with immediate access to clinical research facilities run by local NHS clinicians.

Find out more about the Centre for NanoHealth (CNH).

Spectroscopy

A variety of spectroscopic techniques are available:

  • XPS
  • AES
  • Confocal RAMAN
  • Mass spectrometry
  • ICP spectroscopy
  • Photo correlation spectroscopy for particle sizing down to 1nm

Other equipment

Additional apparatus includes:

  • Laser diffraction particle sizing
  • Free solution electrophoresis BET
  • Gas porosimetry
  • Microcalorimetry
  • omprehensive range of rheometers
  • Gas liquid chromatography
  • HPLC
  • Fully-equipped cleanroom for device fabrication
  • New biotechnology pilot plant
  • Pilot-scale membrane filtration equipment (micro- to nano-filtration)
  • Reverse osmosis

Access to external facilities

The Centre has access to techniques and facilities throughout Wales with our partners in the Pan-Wales nanotechnology initiative that the Centre co-ordinates.

Microscopy

Equipment includes:

  • 2 UHV Omicron Nanotechnology SPMs (1 STM/AFM, 1 STM/ESCA and 1 STM/SEM)
  • 5 Vecco AFMs (2 explorers, 1 Nanoman and 1 Picoforce)
  • 2 Vecco SNOMs (Aurora II and III)
  • 5 desktop SPM systems

Many of these systems have been adapted for a variety of environments and novel applications, for example the in situ growth of organic and inorganic material and the combination of AFM with highspeed photography (5ns intervals) to study cavitation in fluids.

Semiconductor fabrication facilities

  • K J Lesker PVD75 Sputtering tool – Sputters thin films of metals, dielectrics. Heated deposition and pre-deposition plasma clean facility. Moving shutter
  • Oxford Instruments Plasmalab80plus – RIE (Reactive Ion Etcher) for semiconductor dry etching
  • Oxford Instruments Plasmalab80plus – Deposition. Deposition of a-Si, SiO2, nitride for microelectronics or PV
  • Oxide growth tube furnace – For high quality thermal oxide growth (up to 1100º)
  • Jipelec Rapid Thermal Anneal Furnace – (up to 2000ºC in around 2 minutes)
  • Mask Aligner – photolithography
  • Electrical Testing – probe station and electrical analyzer

Modelling

The research is supported by theoretical modelling of:

  • Quantum properties of nano-structures
  • Cavitation in fluids
  • Process control