Suss Microtec

Substrate Conformal Imprint Lithography (SCIL) is a Nano Imprin Lithography (NIL) technique that combines the advantages of a soft working stamp for large area patterning of nano structures. The system can produce features as small as 30nm on a 200mm diameter wafer in just a few minutes.

Application Areas

  • MEMS
  • Sensors
  • Microfluidics
  • Semiconductors
  • Photovoltaics
  • Optoelectronics / photonics
  • Scaffold Fabrication

Schematic illustration of the SCIL imprint and separation sequences

(a) The SCIL stamp is fixed on the stamp holder by vacuum;
(b) The imprint process starts from one side of the stamp;
(c) The imprint is completed by releasing the stamp holder vacuum grooves one by one;
(d) after curing of the resist, the separation process starts from the other side of the stamp;
(e) and (f) the separation process is completed by switching on the vacuum in the grooves one by one.