SPTS Plasma Etch

spp 300x177The ICP (Inductively Coupled Plasma) tool delivers a flexible plasma source capable of etching an extensive and varied range of materials.  By simply changing the etch chemistry the chamber can be utilized in etch applications from high aspect ratio Si features to low damage compound semiconductor applications.

The plasma etch tool is extensively used for fabrication of microfluidics.

Application Areas

  • MEMS (Micro-Electro Mechanical Systems 
  • Microfluidics
  • Semiconductors
  • Waveguides
  • Solar PV
  • Scaffold Fabrication

Case Study

Development of “pain free” microneedles for blood sampling and drug delivery applications.

The plasma tool is able to selectively etch away silicon leaving behind hollow silicon micro plliars  or“microneedles”.

The hollow structures can be injected through the skin to deliver therapeutic drugs – or indeed to extract fluids for subsequent analysis.